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Maintaining precise vacuum pressure and gas flow in your sensitive vacuum processes can be challenging. Concept Vacuum supply manual and fully automated pressure and gas flow control solutions offering reliability and repeatability.
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Here's why you choose Concept Vacuum:
A mass flow controller (MFC) is a device used in vacuum systems to measure and control the flow of process gases or liquids with high precision. It consists of a mass flow sensor, a proportional control valve and a closed-loop control system. MFCs are often used in applications like chemical vapor deposition (CVD), physical vapor deposition (PVD), and analytical instruments ensuring accurate flow rates, flexibility for various gases, and stable conditions within the vacuum chamber.
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